Electron-beam induced deposition nears limit
نویسندگان
چکیده
منابع مشابه
Focused electron beam induced deposition: A perspective
BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...
متن کاملApproaching the resolution limit of nanometer-scale electron beam-induced deposition.
We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by...
متن کاملParallel electron-beam-induced deposition using a multi-beam scanning electron microscope
Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3 as a precursor gas, 14 14 arrays of Pt-containing ...
متن کاملCorrection: Modelling focused electron beam induced deposition beyond Langmuir adsorption
[This corrects the article DOI: 10.3762/bjnano.8.214.].
متن کاملTowards Electron Beam Induced Deposition Improvements for Nanotechnology
Electron beam induced deposition can be applied as a direct write technique for the creation of 3 dimensional nano-scale structures. The technique does not require lift-off and mask based process steps and therefore has potential for application in rapid prototyping for nanotechnology, with a high degree of flexibility. The material quality and microstructure of the deposition however, is usual...
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ژورنال
عنوان ژورنال: Materials Today
سال: 2005
ISSN: 1369-7021
DOI: 10.1016/s1369-7021(05)71016-6